Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm

RM0.00 MYR

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm

Name: Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm
Brand: MTI
SKU: FmSi3N4onCorning79801005FT1P3
Availability: OutOfStock

SKU: silicon-nitride-film-lpcvd-on-corning-7980-film-thickness-1-3um-10x5x0-5mm

Price: RFQ

Description

Silicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1.3um +/- 5% Si3N4 covers both side on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced micro-cracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) • UV Grade Fused Silica (Corning 0F 7980 HPFS) • Size: 10x5x0.5mm • Edge: CNC Ground • Surface Quality: 60/40 or beer • Non-effective Area: 2.0 mm border • TTV: < 20 microns • Polishing: Two sides polished (60/40) • Average Surface Roughness Ra: =< 5 A RMS Optional: you may need tool below to handle the wafer ( click picture to order ) Diamond Scriber for Cutting Single Crystal Substrate - DS-01 Micro-Fiber & Dust Free Wiper, 4"x4", 100 pcs/bag - Wiper-yx-2001 Vacuum Pen SMT-150C (NEW) - EQ-SMT-150C Single Wafer Containers Related Products Thin Films A-Z Crystal wafer A-Z Plasma Cleaner Wafer Containers Dicing saw Film Coater


Diamond Scriber for Cutting Single Crystal Substrate - DS-01	Micro-Fiber & Dust Free Wiper, 4"x4", 100 pcs/bag - Wiper-yx-2001	Vacuum Pen SMT-150C (NEW) - EQ-SMT-150C	Single Wafer Containers