KMg3(AlSi3O10)F2 -Synthetized fluorphlogopite, 20x20 x0.3 thick (mm) ,as cleaved

KMg3(AlSi3O10)F2 -Synthetized fluorphlogopite, 20x20 x0.3 thick (mm) ,as cleaved

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KMg3(AlSi3O10)F2 -Synthetized fluorphlogopite, 20x20 x0.3 thick (mm) ,as cleaved

KMg3(AlSi3O10)F2 -Synthetized fluorphlogopite, 20x20 x0.3 thick (mm) ,as cleaved

SKU: kmg3alsi3o10f2-synthetized-fluorphlogopite-20x20-x0-3-thick-mm-as-cleaved

Price: RFQ

Description

Synthetic fluorophlogopite is obtained by cooling and devitrification of chemical raw materials by high-temperature melting. The single wafer fraction is KMg3(AlSi3O10)F2, which belongs to the monoclinic system and is a typically layered silicate. KMg3(AlSi3O10)F2  is a typical layered silicate. Many of its properties are superior to natural mica. For example, when the temperature is higher than 1200°C, the volume resistivity of synthetic fluorophlogopite is 1000 times higher than that of natural mica under high-temperature conditions. The electrical insulation is good, and the vacuum is very low at high temperatures. As well as being resistant to acids, alkalis, transparent, separable and flexible, it is an important non-metallic insulating material for modern industries and high-tech industries such as motors, electrical appliances, electronics, and aviation.

Density 2.78~2.85 * 10^3 kg/m^3
Volume Resitivity 10^15~10^16 Ω·cm
Surface Resitivity 10^11~10^13 Ω
Dielectric Strength 185~236kV/mm
Permittivity 5.6 ε
dielectric loss 1~4x 10^-4 tg δ
Melting Point 1375 ± 5
Max Working Temperature(Tmax) 1100
Thermal Weight Loss (40 ~ 1180 0.85%
Specific heat capacity 836 J/kg · K
Linear Thermal Expansion () 10 ~ 12 x 10^-6/K
(⊥) 15 ~ 25 x 10^-6/K
Thermal conductivity () 3.75W/m·K
(⊥) 0.55W/m·K
optical axial angle 8° ~ 14°
Hardness Mohs Hardness 3~3.4
Microhardness Hv0.2 1.35GPa
S 138~146
refractive index N_p 1.513~1.544
N_m 1.539~1.564
N_g 1.540~1.566
Ultimate tensile strength  150~200MPa
Compressive strength 400~520MPa
Water absorption 0.14~0.23%
Moisture absorption 0~0.05%
Mosaicity < 0.25
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Temperature 200 600 900
Cleavage 10.0 6.3 2.96
⊥ Cleavage 21.2 11.5 5.08
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Temperature Room temperature 300 500 600 700 800
Volume Resitivity 3.9 x 10^15 5.1 x 10^13 1.6 x 10^13 1.6 x 10^12 5.6x10^11 3.9x10^10
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Aluminum Nitride Substrates: AlN ITO Coated Glass / Plastic 

Silicon Nitride ( Si3N4) Substrate
 SiC Ceramic Substrates   
Silicon Nitride ( Si3N4) Substrate