Description
InSb substrate 10x10x0.5 mm (N type, undoped)
-
Size: 5x5x0.5 mm
-
Orientation:<100> +/-0.5o
-
Polishing: one-side side polished ( back side etched )
-
Packing: Sealed under nitrogen with single wafer container in 1000 class clean room
Properties
-
Growth method: LEC
-
Orientation: (100) +/- 0.5o
-
Doping: Undoped
-
Conductivity type: N type
-
Carrier Concentration: (0.1- 0.85)E15 @77K
-
Mobility: (5.0-3.5)E5 cm2/Vs
-
EPD: <200 / cm 2
|
Other GaAs |
InSb |
Other InAs |
InP |
GaSb |
Wafer Box |
Film Coaters |
RTP Furnaces |