Description
AlN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.
Specifications
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Sizes 2" round
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AlN thin film orientation: (0001)
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Substrate Sapphire Orientation: c axis (0001) +/- 1.0 deg.
Type and Doping for the AlN film Undoped, Semi-insulating -
Macro Defect Density: <=5 cm-2
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Front Surface Finish (Al Face): As-grown
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Back Surface Finish Sapphire as-received finish
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Useable Surface Area >90%
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Edge Exclusion Area 1mm
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Package Single Wafer Container
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AlN layer thickness 1000 nm +/- 5%
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Polish: One side polished
Related data