Description
AllN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.
Specifications
-
Sizes 4” Round
-
Dimensions: 100 mm +/- 2mm
-
Substrate Sapphire Orientation: c-axis (00.1) +/- 0.3deg.
-
Type and Doping: Undoped, Semi-insulating
-
Macro Defect Density: <=5 cm-2
-
Front Surface Finish (Al Face): As-grown
-
Back Surface Finish Sapphire as-received finish
-
Useable Surface Area >90%
-
Edge Exclusion Area 1mm
-
Package Single Wafer Container
-
AlN layer thickness 1000 nm , (¡À 10%)
Related data