Description
AlN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.
Specifications
| Size | 10mmx10mm |
| Substrate Sapphire Orientation | c axis (0001) +/- 1.0 deg. |
| Type and Doping for the AlN film | Undoped, Semi-insulating |
| Macro Defect Density | <5 cm-2 |
| Front Surface Finish (Al Face) | As-grown |
| Back Surface Finish | Sapphire as-received finish |
| Useable Surface Area | >90% |
| Edge Exclusion Area | 1mm |
| Package | Single Wafer Container |
| AlN layer thickness | 1000 nm +/- 5% |
Related data
