Desktop UV-Ozone Cleaner with Effective Cleaning Area 12 “x12 " and Optional Heating Stage - EQ-PCE-33

No Heating Stage

RM0.00 MYR

Desktop UV-Ozone Cleaner with Effective Cleaning Area 12 “x12 " and Optional Heating Stage - EQ-PCE-33

SKU: eq-pce-33

Price: RFQ

Description

PCE-33 is a desktop Ultraviolet (UV) Ozone cleaner that is used for cleaning all types of substrates up to 12 "x 12 " area. Also, it is an excellent tool to remove and strip photoresist and improve surface wettability of Perovskite Film Solar . The UV-Ozone Cleaner has proven to be highly effective for non-acidic, dry, non-destructive atomic cleaning and removal of organic contaminants using intense 185 nm and 254 nm UV light. Under air and room temperature, the 185 line produces Ozone while the 254 line excites organic molecules on the surface. This combination drives the rapid destruction and decimation of organic contaminants. SPECIFICATIONS Input Power AC 220V, 50/60 Hz, (110VAC available upon request ) Power 900 W Max. Environment Requirement Indoor Use Only; Altitude Use Up To 5,500 Feet; Temperature Range 41-104 Degrees Fahrenheit; Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit; Main Power Supply Fluctuations Not To Exceed 10% Of The Nominal Voltage; Overvoltage Category II; Pollution Degree 2; ozone level (ambient) measurement at <45 ppb. UV Lamp One Solid metal double-wave mercury lamp is included Wave Length: 253.7nm and 184.9nm UV lamp service life: 5000 hrs UV light area: 300 x 300 mm Can clean crystal wafer with a diameter up to 12“ x 35 mm thickness. The UV lamp is shipped separately with the machine to avoid potential transportation damage. It's the user's responsibility to read the user manual and carefully install the lamp to the machine. MTI is not responsible for any property, including the lamp, damage that results from improper installation and operation. The fragile UV lamp is not included in any warranty, please click to order a spare . Chamber & Sample Stage Stainless steel case Sliding drawer for easy sample loading The sample stage area is 380 mm x 380 mm Max. sample thickness: 40 mm An ozone venting device is built into the chamber The timer ranges from 0.01 seconds to 99.9 hours. Heatable Sample Stage (optional ) The heatable sample stage is optional up to 150ºC with the precision temperature controller The temperature controller is 30 segments programmable with +/-2 C accuracy Temperature uniformity:<10C within 6 inches diameter area; <20C within 12 inches diameter Heating rate: 15C/min max. The distance between the sample stage and the lamp is adjustable from 20mm to 40mm. Vent Port 4 in. The diameter vent port is built into the back of the machine One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system. Compliance CE certification is available upon request NRTL/CSA certification is available upon request at an extra cost Application Clean s ilicon wafer, Gallium Arsenide wafer, quartz, and ITO glass Clean all types of oxide single crystal substrates such as sapphire, STO, and LAO. Clean gold and Pt surface An oxidizing surface of a light metallic material Activate Polymers and Crosslink Polymers UV Strip Photo Resist / Photoresist UV Clean Production Line LED displays Reference articles 1. C. Koenigsmann et al. J. Am. Chem. Soc. 2011, 133, 25, 9783–9795 . 2. M. Cargnello, J. Am. Chem. Soc. 2015, 137, 21, 6906–6911. 3. D. Li, ACS Catal. 2012, 2, 7, 1358–1362.

Input Power	AC 220V, 50/60 Hz, (110VAC available upon request ) Power 900 W Max.
Environment Requirement	Indoor Use Only; Altitude Use Up To 5,500 Feet; Temperature Range 41-104 Degrees Fahrenheit; Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly to 50% Relative Humidity At 104 Degrees Fahrenheit; Main Power Supply Fluctuations Not To Exceed 10% Of The Nominal Voltage; Overvoltage Category II; Pollution Degree 2; ozone level (ambient) measurement at <45 ppb.
UV Lamp	One Solid metal double-wave mercury lamp is included Wave Length: 253.7nm and 184.9nm UV lamp service life: 5000 hrs UV light area: 300 x 300 mm Can clean crystal wafer with a diameter up to 12“ x 35 mm thickness. The UV lamp is shipped separately with the machine to avoid potential transportation damage. It's the user's responsibility to read the user manual and carefully install the lamp to the machine. MTI is not responsible for any property, including the lamp, damage that results from improper installation and operation. The fragile UV lamp is not included in any warranty, please click to order a spare.
Chamber & Sample Stage	Stainless steel case Sliding drawer for easy sample loading The sample stage area is 380 mm x 380 mm Max. sample thickness: 40 mm An ozone venting device is built into the chamber The timer ranges from 0.01 seconds to 99.9 hours.
Heatable Sample Stage (optional )	The heatable sample stage is optional up to 150ºC with the precision temperature controller The temperature controller is 30 segments programmable with +/-2 C accuracy Temperature uniformity:<10C within 6 inches diameter area; <20C within 12 inches diameter Heating rate: 15C/min max. The distance between the sample stage and the lamp is adjustable from 20mm to 40mm.
Vent Port	4 in. The diameter vent port is built into the back of the machine One 10 ft. flexible pipe and one vent clamp are included for connecting the cleaner exhaust to a lab venting system.
Compliance	CE certification is available upon request NRTL/CSA certification is available upon request at an extra cost
Application	Clean silicon wafer, Gallium Arsenide wafer, quartz, and ITO glass Clean all types of oxide single crystal substrates such as sapphire, STO, and LAO. Clean gold and Pt surface An oxidizing surface of a light metallic material Activate Polymers and Crosslink Polymers UV Strip Photo Resist / Photoresist UV Clean Production Line LED displays
Reference articles	1. C. Koenigsmann et al. J. Am. Chem. Soc. 2011, 133, 25, 9783–9795. 2. M. Cargnello, J. Am. Chem. Soc. 2015, 137, 21, 6906–6911. 3. D. Li, ACS Catal. 2012, 2, 7, 1358–1362.

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