Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD

Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD

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Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD
  • Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD
  • Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD
  • Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD
  • Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD
  • Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD
Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD

Dual-Head 2 Magnetron Plasma Sputtering Coater in Glovebox - VTC-600-2HD-GB-LD

SKU: dual-head-2-magnetron-plasma-sputtering-coater-in-glovebox-vtc-600-2hd-gb-ld

Price: RFQ

Description

 VTC-600-2HD-GB is a compact magnetron sputtering system with dual 2" target sources in the glovebox. The system will provide the environments of oxygen-free and humidity-free (<1 PPM ) for coating and processing air-sensitive thin film. One DC source for coating metallic film, and the other RF source for coating non-metallic material. This coating system is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE, etc. SPECIFICATIONS Glovebox with Purification Chamber dimension: 1200 mm L x 740 mm W x 900 mm H, made of stainless steel. Hinged type front door for loading devices and sample easily Automic purging function for quickly removing O2 and H2O before recirculating purification Automatic regeneration function is built-in in the control panel High-quality purification system ensures O2 and H2O below 1 PPM Two Antechambers for large and small samples delivery Please click the picture at the left-column for detailed specifications of the glovebox. Sputtering Coater The coater is recessed in the bottom of the glovebox with air-tight flange. Two 2" magnetron plasma sputtering guns are installed on the top of the cover, which is a hinged type door. Two sputtering power sources are integrated into one control unit and are placed outside the glovebox. One DC source: 500 W power for coating metallic materials (Pic 1) One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials (Pic 2) -- Pic 1 -- Pic 2 Please click the picture at the left column to see the detailed specification of the sputtering coater Input Power Single-phase 220 VAC 50 / 60 Hz 2500 W (including a vacuum pump and water chiller) Magnetron Sputtering Head Two 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included (Click 1st pic) One is connected to DC source for coating metallic materials The other one is connected to the RF source for non-conductive materials Target size requirement: 2" diameter Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including the backing plate) One Stainless Steel Target target and one Research Grade Al2O3 target are included for demo testing Recommended Sputtering Recipe and Useful Tips Vacuum Chamber Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement Hinged type lid with pneumatic power pole allows easy target change on Sample Stage The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover Sample holder size: 140 mm Dia. for. 4" wafer max Rotation speed: 1 - 20 rpm adjustable for uniform coating The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller Gas & Flow Control Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gases Flow rate: 0 – 200 mL/min & 0 - 100ml/min adjustable on the touch screen control panel Air inlet valve is installed for vacuum release 5N purity Ar gas is required for operating the coating system in the glovebox. Vacuum Pump 240 L/m Double Stage Rotary Vacuum Pump with Exhaust Filter is included to control chamber pressure No turbopump is necessary for the coating system in the glovebox because the purification system can reduce the argon gas to less than 1 ppm level, which is much better than turbopump Water Chiller One digital temperature-controlled recirculating water chiller is included. (Click picture to see details) Refrigeration range: 5~35 °C Flow rate: 16 L/min Pump pressure: 14 psi Optional Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å Click the picture at left to see the detailed specification Compliance CE approval NRTL Certification (UL 1450) is available upon request at extra cost


Glovebox with Purification
  • Chamber dimension: 1200 mm L x 740 mm W x 900 mm H, made of stainless steel.
  • Hinged type front door for loading devices and sample easily
  •  Automic purging function for quickly removing O2 and H2O before recirculating purification
  • Automatic regeneration function is built-in in the control panel
  • High-quality purification system ensures O2 and H2O below 1 PPM
  • Two Antechambers for large and small samples delivery
  • Please click the picture at the left-column for detailed specifications of the glovebox.
Sputtering Coater
  • The coater is recessed in the bottom of the glovebox with air-tight flange.
  • Two 2" magnetron plasma sputtering guns are installed on the top of the cover, which is a hinged type door. 
  • Two sputtering power sources are integrated into one control unit and are placed outside the glovebox.
    • One DC source: 500 W power for coating metallic materials (Pic 1)
    • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials (Pic 2)
  •  -- Pic 1  -- Pic 2
  • Please click the picture at the left column to see the detailed specification of the sputtering coater

Input Power
  • Single-phase 220 VAC 50 / 60 Hz
  • 2500 W (including a vacuum pump and water chiller)






Magnetron Sputtering Head




Vacuum Chamber
  • Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel
  • Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
  • Hinged type lid with pneumatic power pole allows easy target change on




Sample Stage
  • The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
  • Sample holder size: 140 mm Dia. for. 4" wafer max
  • Rotation speed: 1 - 20 rpm adjustable for uniform coating
  • The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas & Flow Control
  • Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gases
    • Flow rate: 0 – 200 mL/min & 0 - 100ml/min adjustable on the touch screen control panel
  • Air inlet valve is installed for vacuum release
  • 5N purity Ar gas is required for operating the coating system in the glovebox.
Vacuum Pump
Water Chiller
  • One digital temperature-controlled recirculating water chiller is included. (Click picture to see details)
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi
Optional
  • Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å
  • Click the picture at left to see the detailed specification

Compliance
  • CE approval
  • NRTL Certification (UL 1450) is available upon request at extra cost