Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8

Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8

RM0.00 MYR
RM0.00 MYR
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Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8
  • Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8
  • Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8
Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8

Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8

SKU: atmosphere-controlled-rtp-furnace-for-8-wafer-up-to-1000-c-vbf-1050x-h8

Price: RFQ

Description
VBF-1050X-H8 is an atmospherically controlled box furnace with IR heating lamps, which can reach 1000ºC with a 5ºC/second heating rate.  It is designed for rapidly annealing thin wafers up to 8" round or 6"square in diameter under vacuum and inert gases

SPECIFICATIONS

Furnace Structure
  • IR heating holder with water cooling is installed in a vacuum chamber ( 16x14x15")
  • The heating chamber of 8.5"x8.5" ( 200x200 mm) dia x 10 mm height 
  • 25 mm dia quartz observation window is built-in on the front door 
  • KF 25 vacuum port  and the valves of the gas inlet and outlet are built into the vacuum chamber
  • A mechanical vacuum gauge is included
  • A digital temperature controller with 30 segments programmable is included
  • A k-type thermal couple is included

Power

 
  • AC 208V-240V,  single phase, 50/60 Hz
  • 12 KW 60A breaker is required
  • Note: A power cable is included without a plug. Please install a plug by yourself or the left  picture to choose a plug according to your lab requirement

Working Temperature

 
  • 30 segments programmable via a digital temperature controller
  • Working Temperature:    <= 800 °C continuously    Max. 1000 °C, < 30 minutes
  • Max. Heating rate:   <= 300°C/ min    5°/second
  • Max. Cooling:           <=  60ºC/min      1°/second
  • Temperature stability: +/- 1°C
  • RS485 port and soft is included for PC operation

    Heating Chamber & Water Chiller
        • Two IR heating plates are built-in stainless steel holders with water cooling jacket
        • 8.5" square x 10 mm height heating chamber with water cooling jacket, which can accept 8"x8"  wafer 
        • One quartz plate is placed in the bottom heating chamber to accept a wafer up to 8" x 5 mm thickness
        • One 16L/minute recirculating water chiller is included for cooling the heating chamber


        Vacuum level and Vacuum Pump
        & Gas delivery system
        ( optional)
        • 10- 2 torr via a rotary mechanical pump ( cold condition ) Pic. 1
        • 10-4 torr via turbopump (a cold condition with baking ) Puc. 2
        • KF25 vacuum port  and gas valves are included
        • One mechanical vacuum gauge is included
        • The vacuum pump is not included. Please click the link below (Pic. 1&2) to order separately
        • Digital vacuum gauge up to 10-5 torr with KF16 port is optional  ( Click Pic 3 to order )
        • You may order an inner gas delivery system by clicking Pic, 4
        •      Pic. 1    Pic. 2Capacitance Diaphragm Gauge with Power Supply, Up to 3.8E-5 Torr - PGC554LDPic. 3 Pic. 4

        Overall Dimensions

        Click the picture to see the details

        Net Weight

        45 kg

        Shipping Weight

        150 lbs

        Shipping Volume

        45"(L) x28"(W) x35"(H) 


        Warranty
        • One-year limited warranty with lifetime support
        • ATTENTION: Any damages caused by the use of corrosive and acidic gasses are not under the coverage of MTI One Year Limited Warranty.

        Compliance
          
        • CE Certified
        • NRTL or CSA certification is available upon request at extra cost.