Description
OTF-1200X-III-HPCVD-S3 is a hybrid PVD and CVD ( HPCVD) deposition system for preparing multilayer 2D materials. The system consists of a three-zone split tube furnace with the unique Source Feeding System that can drive the crucible into a processing tube at desired evaporating temperature. The three-zone split tube furnace can achieve fast heating up to 1200°C and create a different thermal gradient by setting different temperatures for each zone. The source feeding system can push and draw one or three crucibles with evaporation material through the atmosphere controlled 5" D tube furnace and sequentially process up to 3 crucibles (or co-evaporating of 3 at a time) as programmed. This is an ideal solution to conduct HPCVD experiments, especially for preparing multi-layer 2D crystal materials. Its built-in PLC touchscreen allows users to manage the feeding method and monitor the temperature of each source. Three programmable PID temperature controllers provide excellent control without temperature overshooting .
SPECIFICATIONS:
| Furnace Structure |
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| Power Requirement |
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| Heating Zone Length |
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| Temperature Range | 100~1100°C (Continuous); 1200°C (<1 hour) | ||||||||
| Max. Heating Rate | ≤ 10°C /min | ||||||||
| Temperature Controllers |
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| Sequential Source Feeding System |
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| Sample Crucible Movement Control | |||||||||
| Temperature Controllers |
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| Heating Element | Fe-Cr-Al Alloy doped by Mo | ||||||||
| Tube Accessories |
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| Vacuum Pump |
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Gas Flow Control System |
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| Dimensions |
4000mm(L) x 600mm(W) x 1500mm(H) | ||||||||
| Warranty | One-year limited warranty with lifetime support. (Consumable parts such as processing tubes, o-rings are not covered by the warranty, please find the replacements at related products below.) | ||||||||
| Compliance | |||||||||
| Operation Video |
Feature Demonstration Installation Video ![]()
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