Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB

Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB

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Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB
  • Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB
  • Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB
  • Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB
  • Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB
Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB

Plasma Sputtering Coater in Glovebox with 3 Sputtering Heads and RF/DC Power Supplies - VTC-600-3HD-GB

SKU: vtc6003hdgb

Price: RFQ

Description

 VTC6003HDGB is a three-head plasma sputtering coater in a glovebox (O2 & H2O < 1 ppm). This system is designed for researching solid-state thin-film Lithium batteries, also suitable for sequential coating of multiple-layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, etc. Features Three 2" magnetron sputtering guns for co-sputtering or layer by layer growth. Choice of RF and DC power sources Integrated with a glovebox (O2 & H2O < 1 ppm) Easy sample transfer inside a glovebox. SPECIFICATIONS Power 208-240VAC, single phase, 50/60 Hz, 1500 W Glovebox VGB-6 High-quality purification system ensures O2 and H2O below 1 PPM Stainless steel chamber, 1200 mm L x 740 mm W x 900 mm H Hinged-type front door for loading devices and samples easily Automatic purging to evacuate air before recirculating purification Automatic regeneration function Two Antechambers for large and small samples delivery DC/RF Power Supplies Three sputtering power sources Two DC source : 500 W power for coating metallic materials One RF source : 300 W power, 13.56 MHz frequency for coating non-conductive materials Magnetron Sputtering Head Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters Two are connected to DC sources for metallic materials One is connected to the RF source for non-conductive materials Target size: 2" diameter with a thickness of 0.1 - 5 mm Sputtering targets are optional Recommended Sputtering Recipe and Useful Tips Vacuum Chamber Stainless steel vacuum chamber: Ø300 × 300 mm H One 100 mm glass view port. Hinged type top flange for easy sample access Here is a glance of the vacuum chamber Sample Stage Ø140 mm rotating and heating sample stage up to 500°C Rotation speed: 1 - 20 rpm Single-point programmable temperature controller Gas & Flow Control Two mass flow controllers (MFC) Flow rate: 0 – 200 sccm nitrogen calibrated 1/4" vent port. Vacuum Pumping Station (Optional) For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station is recommended Turbo pump . 63 L/s turbomolecular pump , or 260 L/s turbomolecular pump Backing pump 240 L/min rotary vane pump , or 200 L/min dry scroll pump Water Chiller (Optional) Chilled water is required One digital temperature-controlled recirculating water chiller is recommended Refrigeration range: 5~35 °C Flow rate: 16 L/min Pump pressure: 14 psi Film Thickness Measurement (Optional) Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å Compliance CE approval NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.

Power
  • 208-240VAC, single phase, 50/60 Hz, 1500 W

Glovebox VGB-6
  • High-quality purification system ensures O2 and H2O below 1 PPM
  • Stainless steel chamber, 1200 mm L x 740 mm W x 900 mm H
  • Hinged-type front door for loading devices and samples easily
  • Automatic purging to evacuate air before recirculating purification
  • Automatic regeneration function
  • Two Antechambers for large and small samples delivery
DC/RF Power Supplies
  • Three sputtering power sources
    • Two DC source: 500 W power for coating metallic materials 
    • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials


Magnetron Sputtering Head




Vacuum Chamber
  • Stainless steel vacuum chamber: Ø300 × 300 mm H
  • One 100 mm glass view port. 
  • Hinged type top flange for easy sample access
  • Here is a glance of the vacuum chamber
  •     



Sample Stage
  • Ø140 mm rotating and heating sample stage up to 500°C 
  • Rotation speed: 1 - 20 rpm
  • Single-point programmable temperature controller

Gas & Flow Control

Vacuum Pumping Station

(Optional)

Water Chiller

(Optional)
  • Chilled water is required
  • One digital temperature-controlled recirculating water chiller is recommended
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi

Film Thickness Measurement

(Optional)

Compliance
  • CE approval
  • NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.