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High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD
  • High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD
  • High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD
  • High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD
  • High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD
High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD

High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD

SKU: high-vacuum-plasma-enhanced-chemical-vapor-deposition-ccp-type-vtc-pecvd

Price: RFQ

Specifications

 VTC-PECVD is a CCP type  ( Capacitively Coupled Plasma) plasma-enhanced chemical vapor deposition (PECVD) system with a high vacuum chamber. It is designed for plasma-assisted thin-film coating at lowered temperature (200 ~ 500°C), compared to the normal deposition at 700~950°C. The high vacuum chamber also provides a clean environment which greatly improves the film size, uniformity, and film quality. SPECIFICATIONS Power Single-phase 208 - 240 VAC 50 / 60 Hz 4000 W Source Power One 300 W, 13.56 MHz frequency RF power source with auto coupling. PECVD Growth 100 mm Dia. double layer shower head with RF source for 4" wafer Two precision mass flow controllers (MFCs) for two types of working gas Flow rate: 0 – 100 mL/min adjustable on the touch screen control panel Motorized butterfly valves allow a stable working deposition pressure from 0.1 torrs to 1 torr Vacuum Chamber Made of 304 stainless steel Dimension: Dia 300 mm × 300 m H Ultimate vacuum: 6E-7 torr Pumping time: <6E-6 torr after 40 min pumping with turbopump Leak rate: 3.8E-9 torr L/s Viewport: 100 mm dia. glass Fast load-lock door for quick sample loadding and retrieval. Vacuum Pump Turbo Pump: 700 L/s Pfeiffer turbo pump Backing Pump: 240 L/min (4L/s) rotoray vane pump Sample Stage The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover Sample holder size: 100 mm Dia. for. 4" wafer max Rotation speed: 1 - 20 rpm adjustable for uniform coating The holder temperature is PID controlled from RT to 500 °C max with an accuracy of +/- 1.0 °C Clearance: 15 ~ 65 mm between sample stage and plasma head Water Chiller One digital temperature-controlled recirculating water chiller is included. (Click picture to see details) Refrigeration range: 5~35 °C Flow rate: 16 L/min Pump pressure: 14 psi Gas delivery system (optional) 2- 9 channel gas mixing and delivery system is available as an option ( Pic. 1) Vapor gas delivery device is available upon request (Pic. 2&3) Programmable software for customized recipes is available based on customer design Pic. 1 Pic. 2 Pic.3 Net Weight of Coater 160 kg Dimensions Compliance CE approval NRTL Certification (UL 1450) is available upon request at an extra cost Warranty One year limited warranty with lifetime support Operation Demo Video

Power
  • Single-phase 208 - 240 VAC 50 / 60 Hz
  • 4000 W 
Source Power
  • One 300 W, 13.56 MHz frequency RF power source with auto coupling.
              

PECVD Growth

  • 100 mm Dia. double layer shower head with RF source for 4" wafer

  • Two precision mass flow controllers (MFCs) for two types of working gas
    • Flow rate: 0 – 100 mL/min adjustable on the touch screen control panel
  • Motorized butterfly valves allow a stable working deposition pressure from 0.1 torrs to 1 torr



Vacuum Chamber
  • Made of 304 stainless steel
  • Dimension: Dia 300 mm × 300 m H
  • Ultimate vacuum: 6E-7 torr
  • Pumping time: <6E-6 torr after 40 min pumping with turbopump
  • Leak rate: 3.8E-9 torr L/s
  • Viewport: 100 mm dia. glass
  • Fast load-lock door for quick sample loadding and retrieval. 

Vacuum Pump
  • Turbo Pump: 700 L/s Pfeiffer turbo pump 
  • Backing Pump: 240 L/min (4L/s) rotoray vane pump




Sample Stage
  • The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
  • Sample holder size: 100 mm Dia. for. 4" wafer max
  • Rotation speed: 1 - 20 rpm adjustable for uniform coating
  • The holder temperature is PID controlled from RT to 500 °C max with an accuracy of +/- 1.0 °C 
  • Clearance: 15 ~ 65 mm between sample stage and plasma head
                  
Water Chiller
  • One digital temperature-controlled recirculating water chiller is included. (Click picture to see details)
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi
    Gas delivery system
    (optional)
    • 2- 9 channel gas mixing and delivery system is available as an option ( Pic. 1)
    • Vapor gas delivery device is available upon request (Pic. 2&3)
    • Programmable software for customized recipes is available based on customer design
    •  Pic. 1Pic. 2Pic.3

    Net Weight of Coater
    • 160 kg

    Dimensions
    •  

    Compliance
    • CE approval
    • NRTL Certification (UL 1450) is available upon request at an extra cost  

    Warranty
    • One year limited warranty with lifetime support

    Operation Demo Video

    		             
                        

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