Description
AlN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.
Specifications
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Sizes 2” Round
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Dimensions: 50mm +/- 2mm
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Substrate Sapphire Orientation: c-axis (0001) +/- 1.0deg.
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Type and Doping: Undoped, Semi-insulating
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Macro Defect Density: <5 cm-2
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Front Surface Finish (Al Face): As-grown
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Back Surface Finish Sapphire as-received finish
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Useable Surface Area >90%
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Edge Exclusion Area 1mm
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Package Single Wafer Container
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AlN layer thickness 5000 nm , (¡À 10%)
Related data